JX Nippon Mining & Metals offers a wide range of sputtering targets for advanced thin film applications including: semiconductor, flat panel display, and data storage.
Target materials are available in a variety of grades and purities to meet specific customer requirements. Target microstructure and magnetic permeability (for ferro-magnetic materials) are also controlled to maximize target performance.
Targets are available in configurations for all major PVD sputtering systems. Expertise and extensive experience with a variety of bonding technologies (solder bonding, electron-beam welding, and diffusion bonding) assures bonding efficiency without affecting target microstructure.
JX Nippon Mining & Metals is the number one supplier of ITO(indium tin oxide) worldwide for use in flat panel display manufacture. Our ITO is available in an Ultra-high density grade for an extremely high quality thin film with low particulates.
Other sputtering target materials for optical thin films are available and include: molybdenum, tungsten, aluminum alloys and titanium.
JX Nippon Mining & Metals offers a full line of sputtering targets that meet the high quality requirements for magnetic head and media (rigid disk and optical disk) manufacturing. Targets feature fine control of magnetic properties and alloy composition.
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- Aluminum Alloys
- Chromium Alloys
- Cobalt/Cobalt Alloys
- Copper/Copper Alloys
- Indium Tin Oxide (ITO)
- Iridium Alloys
- Manganese Alloys
- Nickel Aluminum
- Nickel Iron
- Nickel Platinum
- Platinum Alloys
- Tantalum/Tantalum Alloys
- Tantalum Silicide
- Titanium/Titanium Alloys
- Tungsten Silicide
ACROTEC® Compound Semiconductor Materials
JX Nippon Mining & Metals is a leading supplier of compound semiconductor materials, known worldwide through its ACROTEC® brand. We have a wide product line that includes bare wafers and expitaxial services. We supply MOVPE and MBE grown epitaxial wafers for optical and electronic device applications, InP single crystal substrates (2", 3" and 4" diameter), CdTe, CdZnTe single crystal substrates (1x1cm to6x6cm), ZnTe single crystal substrates, and 6N and 7N high purity source metals such as In, Cd and Te.
ACROTEC® InP epi wafer services include:
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- InGaAs PD epi wafer
- InGaAsP-MQW-LD epi wafer
- AlGaInAs-MQW-LD epi wafer
As a leader in providing advanced sputtering targets, Nikko Metals understands the strict requirements of semiconductor metallization and back-end packaging applications. OPTIPLATE® anodes were developed with these industry expectations in mind. They are manufactured using the same processes developed for sputtering targets toensure consistency and performance. With Nikko Metals' OPTIPLATE® anodes you can be assured of consistent, quality performance for your electroplating needs - from interconnect toback-end packaging.
Available in a variety of size, and configurations, including specialty material compositions and microstructures.
- Copper Phosphorous
OPTIPLATE® Anodes feature:
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- Void Free Microstructures
- Uniform Dissolution
- Uniform Alloy Distribution
- Consistency and Quality Suitable for the Semiconductor Industry
- R&D and Engineering Support
- Certificate of Analysis Provided with Each Anode
- Cleaned and Packaged toSemiconductor Standards
- Supported by Nikko Metals Worldwide Infrastructure
High Purity Consumable Parts
JX Nippon Mining & Metals has been licensed by Applied Materials to supply specialty consumable components to support IMP sputtering technology. These components (coils and other parts) are used in conjunction with a target in the IMP process of Applied Materials Electra™ Copper and Vectra™ Titanium PVD sources.
JX Nippon Mining & Metals is now licensed for the following high purity consumable kits:
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- Vectra Plus™ IMP Titanium
- Vectra™ IMP Titanium
- Electra™ IMP Copper
- Electra™ IMP Tantalum